FeNi alloys electroplated into porous (n‐type) silicon
Identifieur interne : 000766 ( Main/Exploration ); précédent : 000765; suivant : 000767FeNi alloys electroplated into porous (n‐type) silicon
Auteurs : S. Ouir [Algérie] ; S. Sam [Algérie] ; G. Fortas [Algérie] ; N. Gabouze [Algérie] ; K. Beldjilali [Algérie] ; F. Tighilt [Algérie]Source :
- physica status solidi c [ 1862-6351 ] ; 2008-12.
English descriptors
Abstract
We report here a study on the electrodeposition of FeNi alloys into porous silicon (PS) made in n‐type Si substrate. The electrodeposited thin films were characterized by scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS) and X‐ray diffraction (XRD). The results show that the morphology, composition and structure of the deposited FeNi alloys are strongly dependent on the deposition conditions. A tubular structure of the FeNi alloys can be obtained with a chemical composition of (80%) Ni (20%) Fe. Finally, SEM characterization shows that a good filling of pores with FeNi alloy is achieved. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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DOI: 10.1002/pssc.200780175
Affiliations:
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<front><div type="abstract" xml:lang="en">We report here a study on the electrodeposition of FeNi alloys into porous silicon (PS) made in n‐type Si substrate. The electrodeposited thin films were characterized by scanning electron microscopy (SEM), energy dispersive spectroscopy (EDS) and X‐ray diffraction (XRD). The results show that the morphology, composition and structure of the deposited FeNi alloys are strongly dependent on the deposition conditions. A tubular structure of the FeNi alloys can be obtained with a chemical composition of (80%) Ni (20%) Fe. Finally, SEM characterization shows that a good filling of pores with FeNi alloy is achieved. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)</div>
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